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EFFECT OF PULSED BIAS ON MICROHARDNESS OF TI/TIN MULTILAYER FILMS DEPOSITED BY ARC ION PLATING

ZHAO Yanhui 1), LIN Guoqiang 1, 2) , LI Xiaona 1, 2) , DONG Chuang 1) ,WEN Lishi 1, 3)
1) State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024
2) Physics Department, Dalian University of Technology, Dalian 116024
3) Institute of Metals Research, The Chinese Academy of Sciences, Shenyang 110016
Correspondent: LIN Guoqiang, professor, Tel: (0411)84708380-8301, Email: [email protected]
Supported by National High Technical Research and Development of Programme of China (2002AA302507)

ABSTRACT Ti/TiN nano-multilayer films were deposited on high-speed-steel (HSS) substrates using arc ion plating, in which orthogonal experiments were used to analyze the effects of the electrical parameters of pulsed bias on microhardness of Ti/TiN multilayer films. The results show that of all the pulsed bias related parameters including pulsed bias magnitude, duty ratio and frequency and the geometry parameters including modulation period and period ratio, pulsed bias magnitude is the major factor affecting microhardness of the multilayer films. The maximum microhardness of 34.1GPa was obtained with pulsed bias magnitude 900V, duty ratio 50% and frequency 30kHz, and the responding modulation period is 84nm, the unit set layer thickness of TiN and Ti are 71nm and 13nm, respectively. Due to the large unit set layer thickness used in the present experiments, the nano-scale strengthening effect is not obviously manifested. The increasing of the microhardness correlates in a significant manner with refining film microstructure resulted from the pulsed bias parameters especially the pulsed bias magnitude.
KEYWORDS pulsed bias, arc ion plating, Ti/TiN nano-multilayer films, microhardness

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